Spontaneous Pattern Formation from Focused and Unfocused Ion Beam Irradiation

Focused Ion Beam Lithography

Spontaneous ion beam formation in the laboratory, space, and simulation

J. Carr, Jr., P. A. Cassak, M. Galante, A. M. Keesee, G. Lusk, R. M. Magee, D. McCarren, E. E. Scime, S. Sears, R. Vandervort, N. Gulbrandsen, Martin Goldman, David Newman, and J. P. Eastwood Department of Physics, West Virginia University, Morgantown, West Virginia 26506, USA University of Tromsø, Tromsø, Norway Department of Physics, University of Colorado–Boulder, Boulder, Colorado 80309, US...

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

High-brightness Cs focused ion beam from a cold-atomic-beam ion source

We present measurements of focal spot size and brightness in a focused ion beam system utilizing a laser-cooled atomic beam source of Cs ions. Spot sizes as small as (2.1 ± 0.2) nm (one standard deviation) and reduced brightness values as high as (2.4 ± 0.1) × 107 A m-2 Sr-1 eV-1 are observed with a 10 keV beam. This measured brightness is over 24 times higher than the highest brightness observ...

Simulating discrete models of pattern formation by ion beam sputtering.

A class of simple, (2+1)-dimensional, discrete models is reviewed, which allow us to study the evolution of surface patterns on solid substrates during ion beam sputtering (IBS). The models are based on the same assumptions about the erosion process as the existing continuum theories. Several distinct physical mechanisms of surface diffusion are added, which allow us to study the interplay of e...